MBE-250

Product Description

The MBE system is used to prepare apparent films, ultra-thin films, compound semiconductors, metals, dielectrics, organic compounds and new materials. The system uses liquid nitrogen to cool the cavity and chamber, and can optionally be equipped with a linear shutter and a flux meter.

specification:

1. The ultimate vacuum is less than 5×10^-10 mBar.

2. The substrate temperature control range is 20 K to 1500 K.

3. Up to 12 evaporation sources, each with a capacity of 2 cm³ or 10 cm³.

4. The baking temperature is as high as 250 °C.

5. The chamber diameter can be 256 mm / 300 mm / 500 mm.